Semiconductor process material

C5F8

Octafluorocyclopentene (C5F8)

Specialty fluorocarbon enquiries for semiconductor plasma etching, structured around the customer's process specification, analytical limits and approved package.

FormulaC5F8
CASCAS 559-40-0
ApplicationSemiconductor plasma etching
Commercial basisCustomer specification

Process-specific supply

The recipe defines the useful specification.

C5F8 is used as a fluorocarbon process material in semiconductor plasma etching. The required purity, individual impurity limits, phase and filling basis can be process-specific and must be confirmed before an offer is issued.

SpecificationBy written agreement
Release evidenceBatch CoA
PackagingApplication dependent
Trade reviewEnd use and route

Quality parameters

Specification by agreement

No universal numerical grade is presented here. The quotation and release documentation must follow the specification accepted for the customer's process and package.

Quality boundary. Final product quality is defined only by the agreed specification and the Certificate of Analysis for the specific batch.

Information required

  • Target purity
  • Individual impurity limits
  • Required supply phase and fill basis
  • Package and valve requirements
  • Quantity and schedule
  • Application and end use
  • Country, city and Incoterm
  • Required analytical documents

Commercial review

Send the process requirement.

SG Trading will review the requested specification, compatible packaging, documentation, destination and trade-compliance context before confirming an offer.

Start a C5F8 enquiry
  • Process and tool context
  • Target delivery date
  • Customer or supplier tare
  • Consignee and end user
  • Destination and transit constraints